References

Introductions to micro lithography and particle optics

Introduction to Microlithography , ACS Professional Reference Books, ed. L.F. Thompson, C.G. Wilson and M.J. Bowden (American Chemical Society, Washington, DC, 1994)
Handbook of Charged Particle Optics , Ed. Jon Orloff. ( CRC Press, New York 1997)

Coulomb Interactions in Particle Beams, G.H. Jansen. (Advances in Electronics and Electron Physics, Suppl. 21, Academic Press, Boston, 1990)
G.H. Jansen, Trajectory displacement effect in Particle Projection Lithography Systems: Modifications to the Extended Two-Particle Theory and Monte Carlo Simulation Technique, Journal of Applied Physics, Vol.84, No 8, p. 4549 (1998)
P.Kruit and G.H. Jansen, Space Charge and Statistical Coulomb Effects (Handbook of Charged Particle Optics, Ed. Jon Orloff, CRC Press, New York 1997)

G.H. Jansen, Coulomb interactions in particle beams, J. Vac. Sci. Technol. B6,1977 (1988)
G.H. Jansen, Fast Monte Carlo simulation of charged particle beams, J. Vac. Sci. Technol. A5,146 (1987)
K.D. van der Mast and G.H. Jansen, Monte Carlo simulation of fast electron beam pattern generators, Proc. Microcirc. Eng. p.93 (1987)
K.D. van der Mast, G.H. Jansen and J.E. Barth, The shower-beam concept, Proc. Microcirc. Eng. p.43 (1985)
G.H. Jansen, T.R. Groves and W.Stickel, Energy broadening in electron beams: A comparison of existing theories and Monte Carlo simulation, J. Vac. Sci. Technol. B3,190(1985)
G.H. Jansen and W.Stickel, Trajectory displacement and space charge effect in electron beams: A comparison of theory and Monte Carlo simulation, Proc. Microcirc. Eng. p.167 (1984)
G.H. Jansen, J.M.J. van Leeuwen, K.D. van der Mast, Statistical electron-electron interactions, Proc. Microcirc. Eng. p.99 (1983)
J.M.J. van Leeuwen and G.H. Jansen, Statistical Limitations in electron beam lithography, Optik 65,179 (1983)